Silicon carbide substrate polishing liquid

Our company has a wide range of product layouts in the field of glass polishing, which can meet the rapid polishing of cover glass, microcrystalline glass, soda-lime glass, high borosilicate glass, quartz glass, crystal rhinestones and other glasses, and can also meet the high-precision surface requirements of various filters, bonded prisms, precision optical lenses, etc., and can provide customers with various polishing materials that match the processing technology.

Introduction:

Our silicon carbide substrate polishing liquid is a high-performance chemical solution designed for precision surface treatment of SiC wafers. Utilizing advanced nano-abrasive technology and optimized chemical composition, it achieves exceptional material removal rates while maintaining superior surface quality. The formulation effectively minimizes subsurface damage and controls surface roughness to meet stringent semiconductor requirements.

Application:

This specialized polishing liquid is primarily used in semiconductor manufacturing for SiC power devices, RF components, and LED substrates. It plays a critical role in producing next-generation power electronics for electric vehicles, 5G infrastructure, and industrial power systems. The solution is compatible with both single-side and double-side polishing equipment, ensuring process flexibility for various production needs in the wide-bandgap semiconductor industry.