Polishing liquid for monocrystalline silicon substrate

Our company can provide customers with complete polishing solutions in the field of artificial crystal polishing. It has mature technical solutions in the grinding and polishing links of single crystal germanium, scintillation crystal fluoride crystal, laser crystal, etc., and the products are efficient and stable.

Introduction:

This polishing liquid is a specialized chemical solution designed for high-precision surface treatment of monocrystalline silicon wafers. Utilizing a balanced formula of nano-abrasives and pH-controlled chemical agents, it achieves efficient material removal while maintaining exceptional surface integrity. The solution delivers ultra-low surface roughness (typically below 1nm) with minimal subsurface damage, meeting the stringent requirements of semiconductor manufacturing processes.

Application:

Widely used in semiconductor fabrication, the liquid is essential for producing silicon wafers for integrated circuits, solar cells, and MEMS devices. It plays a critical role in manufacturing processors, memory chips, and power electronics, where perfect surface finish directly impacts device performance. The solution is compatible with both single-side and double-side polishing equipment in modern cleanroom production environments.